发明名称 Semiconductor structure
摘要 A semiconductor structure includes a substrate, an undoped GaP insulating layer formed over the substrate, and a semiconductor layer formed over the GaP layer.
申请公布号 US9064963(B2) 申请公布日期 2015.06.23
申请号 US200711864149 申请日期 2007.09.28
申请人 Infineon Technologies AG 发明人 Nawaz Muhammad
分类号 H01L29/15;H01L29/786;H01L21/762;H01L29/10;H01L29/51;H01L29/78 主分类号 H01L29/15
代理机构 Slater & Matsil, L.L.P. 代理人 Slater & Matsil, L.L.P.
主权项 1. A field-effect transistor, comprising: a substrate; an undoped GaP layer overlying the substrate; a Si1-xGex layer overlying the GaP layer; a fin-shaped Si structure overlying the Si1-xGex layer, said fin-shaped Si structure including a source region and a drain region, wherein the undoped GaP layer and the Si1-xGex layer substantially overlaps the substrate, and wherein the undoped GaP layer and the Si1-xGex layer overlap more of the substrate than the fin-shaped Si structure; and a gate overlying the fin-shaped Si structure.
地址 Neubiberg DE