Method for manufacturing liquid crystal display device

摘要

The present invention provides a method for manufacturing a liquid crystal display device, which hardly causes display unevenness in joining parts in which mutually neighboring exposure regions are overlapped upon carrying out a photo-alignment treatment for forming a horizontal alignment film. The method for manufacturing a liquid crystal display device of the present invention includes a step of forming a horizontal alignment film by carrying out a photo-alignment treatment of irradiating a photo-alignment film material applied to at least one substrate of a pair of substrates with polarized light, wherein the photo-alignment treatment is carried out by exposure to a plurality of regions of one substrate surface; two neighboring regions among the plurality of regions to be exposed include an overlapped part; an irradiation amount of the polarized light to the overlapped part is gradually lowered in one of the two neighboring regions toward the other of the two neighboring regions; and the overlapped part of the two neighboring regions has a width of 20 mm or wider.

主权项

1. A method for manufacturing a liquid crystal display device comprising:
a step of forming a horizontal alignment film by carrying out a photo-alignment treatment of irradiating a photo-alignment film material applied to at least one substrate of a pair of substrates with polarized light, wherein the photo-alignment treatment is carried out by exposing a plurality of regions of one substrate surface of the at least one substrate of the pair of substrates, two neighboring regions among the plurality of regions which are exposed include an overlapping portion, an irradiation amount of the polarized light applied to the overlapping portion is gradually lowered in one of the two neighboring regions in a direction toward another one of the two neighboring regions, the overlapping portion of the two neighboring regions has a width of 20 mm or wider, the liquid crystal display device has an In-Plane Switching alignment mode or a Fringe Field Switching alignment mode, and an entirety of each of the plurality of regions is exposed through one light transmission portion of a photo mask.