发明名称 Photo-curing polysiloxane composition and application thereof
摘要 Disclosed is a photosensitive polysiloxane composition including: a polysiloxane;a quinonediazidesulfonic acid ester;a pyridine derivative of Formula (II);whereinone to three of R1-R5 independently represent a hydroxyl-substituted C1-C6 alkyl group, and the rest of R1-R5 independently represent hydrogen or a C1-C6 alkyl group; anda solvent.
申请公布号 US9063419(B2) 申请公布日期 2015.06.23
申请号 US201313860771 申请日期 2013.04.11
申请人 Chi Mei Corporation 发明人 Wu Ming-Ju;Shih Chun-An
分类号 G03F7/039;G03F7/022;G03F7/023;G03F7/038;G03F7/075 主分类号 G03F7/039
代理机构 Fox Rothschild LLP 代理人 Sacco, Esq. Robert J.;Fox Rothschild LLP
主权项 1. A photo-sensitive polysiloxane composition, comprising: a polysiloxane; a quinonediazidesulfonic acid ester; a pyridine derivative of Formula (II) wherein one to three of R1-R5 independently represent a hydroxyl-substituted C1-C6 alkyl group, and the rest of R1-R5 independently represent hydrogen or a C1-C6 alkyl group; and a solvent, wherein said polysiloxane is obtained by subjecting a silane monomer component to hydrolysis and partial condensation, said silane monomer component including a silane monomer of Formula (I): Si(Ra)t(ORb)4-t  (I) wherein t is an integer ranging from 1 to 3, at least one of Ra is selected from the group consisting of an anhydride-substituted C1-C10 alkyl group, an epoxy-substituted C1-C10 alkyl group, and an epoxy-substituted alkoxy group, and the rest of Ra is selected from the group consisting of hydrogen, a C1-C10 alkyl group, a C2-C10 alkenyl group, and a C6-C15 aryl group, plural Ras being identical with or different from each other when t is 2 or 3, and Rb is selected from the group consisting of a hydrogen atom, a C1-C6 alkyl group, a C1-C6 acyl group, and a C6-C15 aryl group, plural Rbs being identical with or different from each other when 4-t is 2 or 3.
地址 Tainan TW