发明名称 |
Film deposition apparatus |
摘要 |
A film deposition apparatus includes a turntable including plural substrate placing areas in the circumferential direction; a gas nozzle provided to extend from an inner edge to an outer edge of the substrate placing area; a gas evacuation port provided outside of an outer edge of the turntable and downstream in a rotational direction of the turntable with respect to the gas nozzle for evacuating the gas; and a regulation member including a wall portion provided between the gas nozzle and the gas evacuation port for isolating the gas nozzle and the gas evacuation port at least at a part between the inner edge to the outer edge of the substrate placing area while having a space extending from the inner edge to the outer edge of the substrate placing area when a substrate is placed on the substrate placing area. |
申请公布号 |
US9062373(B2) |
申请公布日期 |
2015.06.23 |
申请号 |
US201213571546 |
申请日期 |
2012.08.10 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
Kato Hitoshi;Ushikubo Shigehiro;Hishiya Katsuyuki |
分类号 |
C23C16/44;C23C16/455;H01L21/02 |
主分类号 |
C23C16/44 |
代理机构 |
IPUSA, PLLC |
代理人 |
IPUSA, PLLC |
主权项 |
1. A film deposition apparatus in which a gas is supplied onto a substrate in a vacuum chamber to form a film on the substrate, comprising:
a turntable provided in the vacuum chamber, including plural substrate placing areas formed at a surface of the turntable for placing substrates in the circumferential direction of the turntable configured to be rotated to rotate the substrate placing areas; a gas nozzle provided to extend from an inner edge to an outer edge of the substrate placing area, and provided with plural gas supplying ports along a longitudinal direction of the gas nozzle for supplying gas; a gas evacuation port provided outside of an outer edge of the turntable and downstream in a rotational direction of the turntable with respect to the gas nozzle for evacuating the gas; and a regulation member including a wall portion provided between the gas nozzle and the gas evacuation port and isolating the gas nozzle and the gas evacuation port at least at a part between the inner edge to the outer edge of the substrate placing area while having a space extending from the inner edge to the outer edge of the substrate placing area even when a substrate is placed on the substrate placing area; wherein the regulation member includes a first side wall including the wall portion to extend from inner edge to the outer edge of the substrate placing area, and is provided with an opening portion for evacuating a gas to the gas evacuation port. |
地址 |
Tokyo JP |