发明名称 Semiconductor light emitting element
摘要 In general, according to one embodiment, a semiconductor light emitting element includes: a first semiconductor layer; a second semiconductor layer; a light emitting layer. The light emitting layer includes a well layer with a thickness of t1 (nanometers). The well layer includes InxGa1-xN having an In composition ratio x higher than 0 and lower than 1. The first semiconductor layer has a tensile strain of not less than 0.02 percent and not more than 0.25 percent in a plane perpendicular to a stacking direction. A peak wavelength λp (nanometers) of light satisfies a relationship of λp=a1+a2×(x+(t1−3.0)×a3). The a1 is not less than 359 and not more than 363. The a2 is not less than 534 and not more than 550. The a3 is not less than 0.0205 and not more than 0.0235.
申请公布号 US9065004(B2) 申请公布日期 2015.06.23
申请号 US201414323281 申请日期 2014.07.03
申请人 Kabushiki Kaisha Toshiba 发明人 Sugiyama Naoharu;Kimura Shigeya;Yoshida Hisashi;Hikosaka Toshiki;Tajima Jumpei;Nago Hajime;Nunoue Shinya
分类号 H01L33/12;H01L33/06;H01L33/14;H01L33/00 主分类号 H01L33/12
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A semiconductor light emitting element comprising: a first semiconductor layer of a first conductivity type containing a nitride semiconductor crystal; a second semiconductor layer of a second conductivity type containing a nitride semiconductor crystal; and a light emitting layer provided between the first semiconductor layer and the second semiconductor layer and including a well layer with a thickness of t1 (nanometers), the well layer including InxGa1-xN having an In composition ratio x higher than 0 and lower than 1, the first semiconductor layer having a tensile strain of not less than 0.02 percent and not more than 0.25 percent in a plane perpendicular to a stacking direction from the first semiconductor layer toward the second semiconductor layer, the second semiconductor layer having a tensile strain in the plane, a lattice constant of the well layer being larger than a lattice constant of the first semiconductor layer and larger than a lattice constant of the second semiconductor layer, a peak wavelength λp (nanometers) of light emitted from the light emitting layer satisfying a relationship of λp=a1+a2×(x+(t1−3.0)×a3), the a1 being not less than 359 and not more than 363, the a2 being not less than 534 and not more than 550, the a3 being not less than 0.0205 and not more than 0.0235.
地址 Minato-ku JP