Measurement device and method for vapour deposition applications

摘要

In vapor deposition applications, especially OLED mass production, where it is necessary to measure and/or control the deposition rate of evaporation sources within specific tolerances, a measurement system is adapted to use robust and accurate optical thickness measurement methods at high and low rate sources, so that the thickness of a layer deposited on a substrate can be measured and controlled. A first evaporation source (11) deposits a layer of material on a substrate (20). A mobile element (41) is provided, On which a film is deposited from a second evaporation source (12b) in a deposition location (D1). Subsequently the mobile element is conveyed to a measurement location (D2) where the thickness of the film is measured by a thickness detector (45). The measurement apparatus is arranged to control the deposition of the first evaporation source in dependence on the thickness of the film deposited on the mobile element.

主权项

1. A measurement apparatus for determining the deposition rate of a first evaporation source resp. the thickness of a layer deposited on a substrate by the first evaporation source in vapour deposition applications, especially in organic light emitting diode (OLED) mass production, said apparatus comprising:
a mobile element for providing a surface on which at least one film of vapour can be deposited, wherein the film is to be deposited by a second evaporation source in a deposition location; a thickness detector for detecting the thickness of a film deposited on said mobile element, wherein said thickness detector is arranged, face to face with said mobile element, at a detection location in which the thickness of a film deposited on said mobile element is to be detected; an actuator device for conveying said mobile element;wherein said measurement apparatus is arranged to provide said mobile element from the deposition location to said detection location, and
wherein said measurement apparatus is further arranged to at least one of measure and control the deposition of said first evaporation source in dependence on the thickness of the at least one film deposited on said mobile element by the second evaporation source.