发明名称 Curable resin composition, curable film and their cured products
摘要 A curable resin composition containing a specific vinyl compound obtained by vinylation of a terminal of a bifunctional phenylene ether oligomer having a polyphenylene ether structure in a molecule and a specific bismaleimide compound having at least two maleimide groups in a molecule, a curable film comprising the above composition, a cured product obtained by curing the above composition, and a film obtained by curing the curable film. The above resin composition is excellent in curability even in the presence of oxygen, is curable at a low temperature and is capable of giving a cured product having a low dielectric constant, a low dielectric loss tangent, high heat resistance, excellent mechanical properties, excellent chemical resistance and excellent flame retardancy.
申请公布号 US9062145(B2) 申请公布日期 2015.06.23
申请号 US200812153677 申请日期 2008.05.22
申请人 MITSUBISHI GAS CHEMICAL COMPANY, INC. 发明人 Ohno Daisuke;Ishii Kenji
分类号 C08F283/06;C08F290/06;C08F290/02;C08F299/02 主分类号 C08F283/06
代理机构 Wenderoth, Lind & Ponack, L.L.P. 代理人 Wenderoth, Lind & Ponack, L.L.P.
主权项 1. A curable resin composition containing a vinyl compound (a) represented by the formula (1) or a mixture of at least two kinds of vinyl compounds (a) of the formula (1) which are different in structure from each other, at least one maleimide compound (b) selected from the group consisting of maleimide compounds (b) represented by the formula (5) to the formula (8), and a phosphoric flame retardant (d), wherein the content of phosphorous in the curable resin composition is 0.1 to 5 wt %, and the weight ratio of the vinyl compound (a): the maleimide compound (b) is in the range of 1:0.4 to 1:0.8, wherein —(O—X—O)— represents a moiety of the formula (2) or the formula (3), —(Y—O)— represents an arrangement of a moiety of the formula (4) or a random arrangement of at least two kinds of moieties of the formula (4), and each of a and b is an integer of from 0 to 100, provided that at least one of a and b is not 0, wherein R1, R2, R3, R7 and R8 are the same or different and represent a halogen atom, an alkyl group having 6 or less carbon atoms or a phenyl group and R4, R5 and R6 are the same or different and represent a hydrogen atom, a halogen atom, an alkyl group having 6 or less carbon atoms or a phenyl group, wherein R9, R10, R11, R12, R13, R14, R15 and R16 are the same or different and represent a hydrogen atom, a halogen atom, an alkyl group having 6 or less carbon atoms or a phenyl group, and -A- represents a linear, branched or cyclic bivalent hydrocarbon group having 20 or less carbon atoms, wherein R17 and R18 are the same or different and represent a halogen atom, an alkyl group having 6 or less carbon atoms or a phenyl group, and R19 and R20 are the same or different and represent a hydrogen atom, a halogen atom, an alkyl group having 6 or less carbon atoms or a phenyl group, wherein R21 to R28 are the same or different and represent a hydrogen atom or an alkyl group having 6 or less carbon atoms, and B represents a single bond, a bivalent hydrocarbon group having 20 or less carbon atoms or an oxygen atom, wherein R29 to R36 are the same or different and represent a hydrogen atom or an alkyl group having 6 or less carbon atoms, and D represents a bivalent hydrocarbon group having 20 or less carbon atoms, wherein R37 to R47 are the same or different and represent a hydrogen atom or an alkyl group having 6 or less carbon atoms and c is an integer of 1 to 20, wherein E represents a bivalent aliphatic hydrocarbon group having 20 or less carbon atoms.
地址 Tokyo JP