| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition having good resolution.SOLUTION: The resist composition comprises: a resin including a structural unit represented by formula (I) and another structural unit that is different from the structural unit represented by formula (I) and includes an acid-labile group; a resin including a structural unit having a fluorine atom; and an acid generator. In formula (I), Rrepresents an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, a hydrogen atom, or a halogen atom; Lrepresents a trivalent saturated hydrocarbon group having 1 to 30 carbon atoms; and R, R, Rand Reach independently represent an aliphatic hydrocarbon group having 1 to 12 carbon atoms. |
