发明名称 POSITIVE PHOTOSENSITIVE COMPOSITIONS
摘要 The present invention relates to a positive photosensitive composition containing a siloxane polymer (A), a naphthoquinone diazide derivative (B) represented by Chemical formula (1) or (2), and an organic solvent (C). A cured film obtained by curing the positive photosensitive composition with heat at 350°C or higher has light transmittance of 95% per thickness of 1 μm in the wavelength of 400 nm. In Chemical formula (1) and (2), R1 and R2 independently represent aryl.
申请公布号 KR20150068899(A) 申请公布日期 2015.06.22
申请号 KR20140163610 申请日期 2014.11.21
申请人 JNC CORPORATION 发明人 OKAMOTO YUKI;KIMURA YUKI;ETOU TOMOHIRO
分类号 G03F7/075;G03F7/022;G03F7/039 主分类号 G03F7/075
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