发明名称 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMING METHOD, AND COMPOUND
摘要 PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which is excellent in LWR performance, CDU performance, resolution, rectangularity of a cross-sectional shape, depth of focus, exposure latitude, and MEEF performance while securing good storage stability.SOLUTION: The radiation-sensitive resin composition contains a polymer having a structural unit containing an acid-dissociable group, a radiation-sensitive acid generator, and a compound having a partial structure represented by the formula (1). In the formula (1), Ris a hydrogen atom, a halogen atom, a nitro group, or a C1-C30 monovalent organic group, and Xis a monovalent radiation-sensitive onium cation.
申请公布号 JP2015114632(A) 申请公布日期 2015.06.22
申请号 JP20130258740 申请日期 2013.12.13
申请人 JSR CORP 发明人 NAMAI HAYATO
分类号 G03F7/004;C07D295/08;C07D295/22;C07D307/00;C07D307/33;C07D309/32;C07D319/06;C07D327/04;C07D493/18;C08F220/22;C08F220/28;G03F7/038;G03F7/039;G03F7/32;H01L21/027 主分类号 G03F7/004
代理机构 代理人
主权项
地址