METHOD FOR PRODUCING PHOTOCATALYST FUNCTIONAL MATERIAL AND METHOD FOR PRODUCING SPUTTERING TARGET FOR FORMING PHOTOCATALYTIC FILM

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a photocatalyst functional material in which a photocatalytic film having an excellent photocatalytic action is formed on a substrate having low heat resistance. ! SOLUTION: There is provided a method for producing a photocatalyst functional material, which comprises: a step of preparing a sputtering target for forming a photocatalytic film formed by press-molding a raw material containing a photocatalyst powder at a temperature where a photocatalytic action is not deteriorated; and a step of forming a photocatalytic film 2 on a substrate 1 by a sputtering method at a temperature where the substrate 1 having low heat resistance is not deformed using the sputtering target for forming a photocatalytic film. The photocatalyst powder is preferably anatase type titanium oxide powder or a tungsten oxide powder and the substrate 1 having low heat resistance is preferably composed of an organic material. ! COPYRIGHT: (C)2015,JPO&INPIT