发明名称 SOLID-STATE IMAGING ELEMENT, ELECTRONIC APPARATUS, AND METHOD FOR MANUFACTURING SOLID-STATE IMAGING ELEMENT
摘要 PROBLEM TO BE SOLVED: To achieve improved accuracy of alignment in forming a black resist layer. ! SOLUTION: Light collected by each of microlenses is received at a light receiving part, which is not shown, through an opening provided between wirings. Light from an adjacent microlens is blocked by a black resist layer, at a gap between the microlenses, and thereby deterioration in optical characteristics can be prevented and light collecting characteristics can be improved. The present disclosure can be applied, for example, for a solid-state imaging element used in an imaging device. ! COPYRIGHT: (C)2015,JPO&INPIT
申请公布号 JP2015115386(A) 申请公布日期 2015.06.22
申请号 JP20130254731 申请日期 2013.12.10
申请人 SONY CORP 发明人 SUENAGA RYOSUKE
分类号 H01L27/14;H04N5/369 主分类号 H01L27/14
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