| 摘要 |
PROBLEM TO BE SOLVED: To provide an oxide sputtering target capable of suppressing occurrence of target crack by heightening relative density, achieving sputtering deposition by high power, and depositing a CeO-based thin film excellent in UV cut characteristic.SOLUTION: An oxide sputtering target is an oxide fired body of a metal containing Zn: 30-90 at% and a residue: Ce and inevitable impurities. The oxide fired body has a structure comprising a ZnO phase and a CeOphase in which added Zn exists in the form of ZnO, since formation of a complex oxide of Ce and Zn is a cause of lowering of crack resistance. |
