发明名称 SUBSTRATE HOLDING DEVICE, SEMICONDUCTOR PRODUCTION APPARATUS, AND SUBSTRATE ATTRACTION DISCRIMINATION DEVICE
摘要 PROBLEM TO BE SOLVED: To easily discriminate whether or not a substrate is attracted normally by means of an electrostatic chuck, regardless of the type of a substrate to be handled.SOLUTION: A substrate holding device H includes an electrostatic chuck 2 having an electrode 11 internally, and including a substrate holding surface S for holding a substrate 1 on the side, a displacement meter 3 arranged above or below the substrate holding surface S, and a controller 6 for controlling the displacement meter 3 to measure a first distance to the substrate 1 when the substrate 1 is mounted on the substrate holding surface S, and to measure a second distance to the substrate 1 after a predetermined voltage is applied to the electrode 11 of the electrostatic chuck 2, and then discriminating whether or not the substrate 1 is attracted normally to the electrostatic chuck 2, based on the difference of the distances thus measured.
申请公布号 JP2015115467(A) 申请公布日期 2015.06.22
申请号 JP20130256521 申请日期 2013.12.11
申请人 NISSIN ION EQUIPMENT CO LTD 发明人 CHO IKO;HIKAWA KAZUNORI
分类号 H01L21/683;B23Q17/00;H02N13/00 主分类号 H01L21/683
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