| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas treatment device exhibiting excellent treatment capability. ! SOLUTION: A treatment chamber 24 includes a first treatment unit 24a, a second treatment unit 24b, and a third treatment unit 24c. The second treatment unit 24b is located closer than the first treatment unit 24a to an exhaust port 23. The third treatment unit 24c is located closer than the second treatment unit 24b to the exhaust port 23. At least one type of an inorganic compound selected from a group consisting of metal oxides, metal hydroxides, and metal carbonates is arranged in the first treatment unit 24a. At least one type of an inorganic compound selected from the group consisting of the metal oxides, the metal hydroxides, and the metal carbonates and reducer containing sulfur atoms are arranged in the second treatment unit 24b. At least one of adsorbent adsorbing a sulfur oxide and reactant reacting with the sulfur oxide is arranged in the third treatment unit 24c. ! COPYRIGHT: (C)2015,JPO&INPIT |
