发明名称 WAFER PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To split a wafer, in which a modified layer is formed, efficiently and to remove the split waste without blowing away a chip.SOLUTION: A wafer 20 in which a modified layer is formed along a scheduled split line is mounted on a mounting table 12, and the wafer 20 mounted on the mounting table 12 is submerged into the cleaning water 30 in a water tank 13. An ultrasonic sound supply section 14 supplies ultrasonic sound to the wafer 20 submerged into the cleaning water 30. A plurality of chips are produced by splitting the wafer 20 into small pieces along a scheduled split line with the ultrasonic sound supplied by the ultrasonic sound supply section 14, and then the chips thus produced are cleaned.
申请公布号 JP2015115350(A) 申请公布日期 2015.06.22
申请号 JP20130254067 申请日期 2013.12.09
申请人 DISCO ABRASIVE SYST LTD 发明人 OBATA SO
分类号 H01L21/301 主分类号 H01L21/301
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