发明名称 |
NITRIDE SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND DIODE AND FIELD EFFECT TRANSISTOR |
摘要 |
PROBLEM TO BE SOLVED: To suppress deterioration of current collapse and make a nitride semiconductor device have low ON resistance by suppressing diffusion of impurities forming an acceptor level.SOLUTION: A nitride semiconductor device comprises: a semiconductor laminated body having a superlattice structure where a substrate 11, a buffer layer 12, an electron transit layer 13 provided on the buffer layer 12, and nitride semiconductor layers having different Al composition ratios are laminated several times, and an electron supply layer 14 having a bandgap averagely being wider than that of the electron transit layer 13 and an etching sacrificial layer 15; a nitride semiconductor body provided on the semiconductor laminated body and having a bandgap averagely being narrower than that of the electron supply layer 14; a spacer layer 16 containing p-type impurities forming an acceptor level; and a semiconductor layer 17. An impurity concentration of the spacer layer 16 decreases from a boundary at the semiconductor layer 17 along a film thickness direction, toward a boundary at the etching sacrificial layer 15. |
申请公布号 |
JP2015115371(A) |
申请公布日期 |
2015.06.22 |
申请号 |
JP20130254499 |
申请日期 |
2013.12.09 |
申请人 |
FURUKAWA ELECTRIC CO LTD |
发明人 |
UMENO KAZUYUKI ; OTOMO SHINYA ; SHINAGAWA TATSUSHI ; IKEDA MASAKIYO ; ISHII HIROTATSU |
分类号 |
H01L21/337;H01L21/205;H01L21/28;H01L21/338;H01L27/098;H01L29/06;H01L29/41;H01L29/47;H01L29/778;H01L29/808;H01L29/812;H01L29/872 |
主分类号 |
H01L21/337 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|