CHEMICAL VAPOR DEPOSITION APPARATUS FOR FLAT DISPLAY

摘要

Disclosed is a chemical vapor deposition apparatus for a flat display. According to an embodiment of the present invention, the chemical vapor deposition apparatus for a flat display comprises: a process chamber in which a deposition process of a substrate is proceeded; a susceptor installed to be capable of moving up and down in the process chamber and where the substrate is loaded; a viewport combined with the substrate loaded on the susceptor and the process chamber to shoot alignment of a mask settled on the substrate; and a shutter unit formed to be rotatable for opening and closing the viewport.