APPARATUS FOR WAFER CLEANING

摘要

The present invention relates to an apparatus for cleaning an wafer in a bath. The apparatus comprises: a wafer support unit in which a plurality of wafers are arranged at the center in the bath and are supported; and a cleaning solution supply unit formed at the bottom of the water support unit. The cleaning solution supply unit is combined to make a plurality of plates have a plurality of surfaces, and is enlarged to a direction in which the wafer is arranged. A plurality of supply holes to spray a cleaning solution is formed on a plate corresponding to a direction crossing the direction in which the wafer is arranged among the plates.