发明名称 APPARATUS FOR CUTTING SUBSTRATE
摘要 <p>Disclosed is an apparatus for cutting a substrate capable of removing dust generated in a substrate, and lowering a temperature elevated by a laser when the substrate is processed, by locally injecting air into a part where a laser is radiated in the substrate. According to an embodiment of the present invention, the apparatus for cutting a substrate comprises: a stage unit on which a substrate is placed; a laser irradiation unit spaced apart from the stage unit, and radiating a laser toward the substrate to process the substrate placed on the stage unit; an air supply unit prepared to supply air toward the substrate heated by the laser irradiation unit, and combined with the stage unit; and an air concentration unit connected with the air supply unit to inject air supplied from the air supply unit into the heated part of the substrate.</p>
申请公布号 KR101530029(B1) 申请公布日期 2015.06.19
申请号 KR20130163641 申请日期 2013.12.26
申请人 SFA ENGINEERING CORP. 发明人 CHOI, KYO WON;CHAE, HEE BYEONG;KIM, DOO HWAN
分类号 B23K26/38;B23K26/14;B23K26/364 主分类号 B23K26/38
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