发明名称 |
APPARATUS FOR CUTTING SUBSTRATE |
摘要 |
<p>Disclosed is an apparatus for cutting a substrate capable of removing dust generated in a substrate, and lowering a temperature elevated by a laser when the substrate is processed, by locally injecting air into a part where a laser is radiated in the substrate. According to an embodiment of the present invention, the apparatus for cutting a substrate comprises: a stage unit on which a substrate is placed; a laser irradiation unit spaced apart from the stage unit, and radiating a laser toward the substrate to process the substrate placed on the stage unit; an air supply unit prepared to supply air toward the substrate heated by the laser irradiation unit, and combined with the stage unit; and an air concentration unit connected with the air supply unit to inject air supplied from the air supply unit into the heated part of the substrate.</p> |
申请公布号 |
KR101530029(B1) |
申请公布日期 |
2015.06.19 |
申请号 |
KR20130163641 |
申请日期 |
2013.12.26 |
申请人 |
SFA ENGINEERING CORP. |
发明人 |
CHOI, KYO WON;CHAE, HEE BYEONG;KIM, DOO HWAN |
分类号 |
B23K26/38;B23K26/14;B23K26/364 |
主分类号 |
B23K26/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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