| 摘要 |
A treatment method (100) for avoiding or limiting the charge effects on a supporting member formed by an insulating substrate or a resin and intended to be subjected to electron radiation, characterised in that it comprises the following steps: depositing (101) a non-conductive sacrificial layer (203, 203') on the substrate or the resin, depositing (102) a conductive layer (204, 204') on the sacrificial layer (203, 203'), carrying out electron radiation (103) for lithography or observation, eliminating (104) the sacrificial layer (203, 203') and the conductive layer (204, 204'). |
