PARTS OF SEMICONDUCTOR AND DISPLAY EQUIPMENTS WITH IMPROVED ANTI-PLASMA CORROSION AND METHOD IMPROVING ANTI-PLASMA CORROSION OF PARTS

摘要

To solve a problem that the process component of semiconductor or display manufacturing equipment is etched by the exposure of plasma, the present invention relates to a method of processing anti-plasma corrosion of a process component by removing peaks and valleys of the surface of ceramic powder (the surface of a coating layer and the surface of the process component) before and after powder coating is performed on the process component, and the process component with improved anti-plasma corrosion. Provided is a process component of semiconductor or display manufacturing equipment exposed by plasma. A coating layer is formed on the surface of a main body where valleys and peaks are partly or totally removed. Provided is a process component with improved anti-plasma corrosion where valleys and peaks are partly or totally removed on the surface of a coating layer.