SHOWERHEAD STRUCTURE, SUBSTRATE PROCESSING APPARATUS, AND METHED FOR FORMING INJECTION HOLE FOR SHOWERHEAD

摘要

The present invention relates to a substrate processing apparatus. More particularly, the present invention relates to a showerhead structure, a substrate processing apparatus including the same, and a method for forming an injection hole for a showerhead. The present invention relates to the showerhead structure of a substrate processing apparatus including: a process chamber where a substrate support unit for supporting a substrate is installed and a closed process space is formed; and a shower head assembly which is installed to the upper side of the process space, and includes injection plates having injection holes formed to the vertical direction to inject gas to the process space. At least parts of the injection holes have the internal diameterφ_1 of the upper end of the injection hole is greater than the internal diameterφ_2 of the lower end of the injection hole. At least parts of the inner surface which connect the lower end of the injection hole and the upper end of the injection hole have an inclined part with an angleθof 26°<=θ<=40°with regard to the center axis of the injection hole.