MOLD FOR IMPRINT, METHOD OF MANUFACTURING THE SAME, AND MOLD SUBSTRATE FOR IMPRINT

摘要

PROBLEM TO BE SOLVED: To provide a mold for imprint which reduces generation a focus error due to surface roughness or scratches of a substrate during transfer of a minute pattern and has a highly accurate minute pattern, and also to provide a method of manufacturing the same.SOLUTION: A mold for imprint includes: an opaque planarization layer 6 including polysilazane on a substrate 2 made of stainless steel; an adhesion layer 7 made of amorphous silicon; and a layer 8 for the formation of a minute pattern including chrome, and transfers the minute pattern. The outer peripheral surface of the substrate may be coated by a planarizing agent by rotating the substrate using a plurality of rollers.