| 发明名称 |
IMPRINT METHOD AND IMPRINT APPARATUS |
| 摘要 |
According to one embodiment, an imprint method is provided. In the imprint method, minute objects adhering to a shot of a substrate, on which imprinting is next performed, are removed after delivering the substrate to the interior of an imprint apparatus and before dropping a resist onto the substrate. Thereafter, a resist is dropped onto the shot. Further, a template that is an original plate having a concave-convex pattern is brought into contact with the resist to form a resist pattern on the substrate according to the concave-convex pattern. |
| 申请公布号 |
US2015170922(A1) |
申请公布日期 |
2015.06.18 |
| 申请号 |
US201414193705 |
申请日期 |
2014.02.28 |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
TAKAKUWA MANABU |
| 分类号 |
H01L21/304;C23C16/458;H01L21/67 |
主分类号 |
H01L21/304 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An imprint method comprising:
removing minute objects adhering to a shot of a substrate, on which imprinting is next performed, after delivering the substrate to an interior of an imprint apparatus and before dropping a resist onto the substrate; dropping a resist onto the shot; and bringing a template that is an original plate having a concave-convex pattern into contact with the resist to form a resist pattern on the substrate according to the concave-convex pattern. |
| 地址 |
Minato-Ku JP |
