发明名称 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE AND ORGANIC EL DISPLAY DEVICE
摘要 Provided are: a photosensitive resin composition which has excellent adhesion to a base, high transmittance, high heat resistance and high sensitivity; a method for producing a cured film; a cured film; a liquid crystal display device; and an organic EL display device. A photosensitive resin composition which contains (A) a polybenzoxazole precursor containing a repeating unit represented by general formula (1), (B) a photoacid generator which generates an acid having a pKa of 4 or less, (C) a solvent and (D) a crosslinking agent having two or more crosslinkable groups which are reactive with a benzene ring and/or a phenolic hydroxyl group. In the formula, R1 and/or R2 is an acid-decomposable group. AA General formula (1)
申请公布号 WO2015087831(A1) 申请公布日期 2015.06.18
申请号 WO2014JP82413 申请日期 2014.12.08
申请人 FUJIFILM CORPORATION 发明人 SUGIHARA KOICHI;ANDO TAKESHI;AMEMIYA TAKUMA
分类号 G03F7/039;C08L79/04;G02F1/1333;G03F7/004;G03F7/075;G03F7/40;H01L21/027;H01L51/50;H05B33/12;H05B33/22 主分类号 G03F7/039
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