发明名称 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE AND ORGANIC EL DISPLAY DEVICE
摘要 Provided are: a photosensitive resin composition which has excellent sensitivity, transmittance, pencil hardness and electrical characteristics after a high-humidity treatment; a method for producing a cured film; a cured film; a liquid crystal display device; and an organic EL display device. A photosensitive resin composition which contains (A) a polybenzoxazole precursor containing a repeating unit represented by general formula (1) and satisfying the requirement (1) and/or (2) below, (B) a photoacid generator and (C) a solvent. (1) The polybenzoxazole precursor contains (a-1) a repeating unit which is represented by general formula (1), and wherein R1 and/or R2 is an acid-decomposable group, and (a-2) a repeating unit which is represented by general formula (1), and wherein R1 and/or R2 is a crosslinkable group. (2) The polybenzoxazole precursor contains (a-3) a repeating unit which is represented by general formula (1), and wherein one of R1 and R2 contains an acid-decomposable group and the other is a crosslinkable group.
申请公布号 WO2015087832(A1) 申请公布日期 2015.06.18
申请号 WO2014JP82414 申请日期 2014.12.08
申请人 FUJIFILM CORPORATION 发明人 AMEMIYA TAKUMA;ANDO TAKESHI
分类号 G03F7/039;G02F1/1333;H01L51/50;H05B33/22 主分类号 G03F7/039
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