PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE AND ORGANIC EL DISPLAY DEVICE

摘要

Provided are: a photosensitive resin composition which has excellent sensitivity, high-temperature resistance, high-temperature cycle resistance and slit coatability; a method for producing a cured film; a cured film; a liquid crystal display device; and an organic EL display device. A photosensitive resin composition which contains (A) a polybenzoxazole precursor containing a repeating unit represented by general formula (1), (B) a photoacid generator, (C) a solvent and (D) a compound having a group wherein at least a part of an acid group is protected by an acid-decomposable group. The content of the compound having a group wherein at least a part of an acid group is protected by an acid-decomposable group is 5-50 parts by mass relative to 100 parts by mass of the polybenzoxazole precursor (A). AA General formula (1)