ELECTROLYTIC COPPER FOIL AND MANUFACTURING METHOD THEREFOR

摘要

This invention provides a high-gloss electrolytic copper foil that can be manufactured in a short amount of time. When the surface of said electrolytic copper foil is analyzed using electron backscatter diffraction (EBSD), the surface-area percentage of {100} planes that are offset from the <001> crystallographic orientation by no more than 18° is at least 10%, and at least one surface of the electrolytic copper foil exhibits a glossiness (Gs (20°)), as measured in accordance with JIS Z 8741:1997, of at least 1,500.