发明名称 PROCESS FOR FORMING EDGE WORDLINE IMPLANTS ADJACENT EDGE WORDLINES
摘要 A process for forming tilted edge wordline implants is disclosed. The process includes forming a first drain implant in a substrate, forming a first tilted implant in a substrate adjacent a first edge wordline to supplement said first drain implant where the first tilted implant is provided at a tilt angle from a first direction and forming a second tilted implant in the substrate adjacent a second edge wordline to supplement another first drain implant where the second tilted implant is provided at a tilt angle from a second direction. A second drain implant is formed in the substrate.
申请公布号 US2015171100(A1) 申请公布日期 2015.06.18
申请号 US201314108780 申请日期 2013.12.17
申请人 Spansion LLC 发明人 THURGATE Timothy;SUN Yu;CHEN Chun
分类号 H01L27/115;H01L21/265 主分类号 H01L27/115
代理机构 代理人
主权项 1. A method for forming tilted edge wordline implants, said method comprising: forming a first drain implant in a substrate; forming a first tilted implant in a substrate adjacent a first edge wordline to supplement said first drain implant wherein said first tilted implant is provided at a tilt angle from a first direction; forming a second tilted implant in said substrate adjacent a second edge wordline to supplement the first drain implant wherein said second tilted implant is provided at a tilt angle from a second direction; and forming a second drain implant in said substrate.
地址 Sunnyvale CA US
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