| 发明名称 |
CLEANING COMPOSITION FOR REMOVING ORGANIC MATERIAL AND METHOD OF FORMING SEMICONDUCTOR DEVICE USING THE COMPOSITION |
| 摘要 |
Provided are a cleaning composition for removing an organic material remaining on an organic layer and a method of forming a semiconductor device using the composition. The cleaning composition includes 0.01-5 wt %.hydroxide based on a total weight of the cleaning composition and deionized water. |
| 申请公布号 |
US2015166942(A1) |
申请公布日期 |
2015.06.18 |
| 申请号 |
US201414466338 |
申请日期 |
2014.08.22 |
| 申请人 |
KANG Ingoo;KANG Dong-Min;KIM Sangkyun;KIM Yun-Jeong;CHOI Jungsik;HONG Young Taek |
发明人 |
KANG Ingoo;KANG Dong-Min;KIM Sangkyun;KIM Yun-Jeong;CHOI Jungsik;HONG Young Taek |
| 分类号 |
C11D11/00;C11D7/06;H01L21/02;H01L21/311;H01L21/3105;C11D7/32;C11D7/50 |
主分类号 |
C11D11/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A cleaning composition for removing an organic residue on an organic layer, the cleaning composition comprising:
0.01 to 5 wt. % hydroxide based on a total weight of the cleaning composition; and deionized water. |
| 地址 |
Yongin-si KR |
