| 发明名称 |
SYSTEMS AND METHODS FOR MONITORING AND CONTROLLING PARTICLE SIZES IN SLURRIES |
| 摘要 |
Systems and methods are provided for preparing a plurality of slurry particles. The system includes: a tank configured to contain and provide the slurry particles, a sampling module configured to sample at least one slurry particle within the tank and obtain at least one parameter related to a particle size, and a controller coupled to the tank and the sampling module, configured to vibrate the slurry particles within the tank based on the at least one parameter. |
| 申请公布号 |
US2015170929(A1) |
申请公布日期 |
2015.06.18 |
| 申请号 |
US201314132167 |
申请日期 |
2013.12.18 |
| 申请人 |
Taiwan Semiconductor Manufacturing Company Limited |
发明人 |
CHIANG I-CHEN;CHEN YUNG-LONG;TSENG CHIH-CHIANG;YIN CHI-CHAN |
| 分类号 |
H01L21/306;H01L21/67;H01L21/66;B01F11/00;B01F15/00 |
主分类号 |
H01L21/306 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A system for preparing a plurality of slurry particles, the system comprising:
a tank configured to contain and provide the slurry particles; a sampling module configured to sample at least one slurry particle within the tank and obtain at least one parameter related to a particle size; and a controller coupled to the tank and the sampling module, configured to vibrate the slurry particles within the tank based on the at least one parameter. |
| 地址 |
Hsinchu TW |
