PLASMA-ASSISTED CHEMICAL GAS SEPARATION METHOD HAVING INCREASED PLASMA DENSITY AND DEVICE FOR IMPLEMENTING THE METHOD

摘要

The invention relates to a method and a device for coating surfaces of a substrate (8) according to the technique of plasma-assisted chemical vapor deposition. The basic idea of the present invention is to increase the ion concentration prevailing in the plasma so as to have more ions accumulate on the substrate (8) and to promote layer growth (12). According to the invention, the ion concentration is increased by forming a so-called fireball at the surface of the substrate (8) to be coated. The term fireball refers to the ionization processes that occur on electrode surfaces (2) as spontaneous small brightly luminescent phenomena in plasma processes. To this end, an electrode (2) is introduced into an existing background plasma and connected to a positive potential (4).

主权项

1. A method for coating surfaces of a substrate according to the technique of plasma-assisted chemical vapor deposition,
characterized in that the plasma density at the surface of the substrate (8) is increased by the formation of a fireball (6) that forms at a positively biased (4) electrode surface (2).