发明名称 PRE-CUTTING A BACK SIDE OF A SILICON SUBSTRATE FOR GROWING BETTER III-V GROUP COMPOUND LAYER ON A FRONT SIDE OF THE SUBSTRATE
摘要 The present disclosure involves an apparatus. The apparatus includes a substrate having a front side a back side opposite the front side. The substrate includes a plurality of openings formed from the back side of the substrate. The openings collectively define a pattern on the back side of the substrate from a planar view. In some embodiments, the substrate is a silicon substrate or a silicon carbide substrate. Portions of the silicon substrate vertically aligned with the openings have vertical dimensions that vary from about 100 microns to about 300 microns. A III-V group compound layer is formed over the front side of the silicon substrate. The III-V group compound layer is a component of one of: a light-emitting diode (LED), a laser diode (LD), and a high-electron mobility transistor (HEMT).
申请公布号 US2015171266(A1) 申请公布日期 2015.06.18
申请号 US201514630714 申请日期 2015.02.25
申请人 TSMC Solid State Lighting Ltd. 发明人 Li Zhen-Yu;Lin Chung-Pao;Hsia Hsing-Kuo;Kuo Hao-Chung;Shu Cindy Huichun;Huang Hsin-Chieh
分类号 H01L33/00;H01L29/66;H01L21/02;H01L33/12;H01L21/268;H01L21/306;H01S5/343;H01S5/02;H01L29/205;H01L29/20 主分类号 H01L33/00
代理机构 代理人
主权项 1. A method, comprising: forming a plurality of recesses on a first surface of a substrate, the substrate being a silicon substrate or a silicon carbide substrate; and thereafter forming one or more III-V group compound layers over a second surface of the substrate, the first surface and the second surface being opposite one another.
地址 Hsinchu TW