| 发明名称 |
METHOD AND SYSTEM OF PROVIDING DOPANT CONCENTRATION CONTROL IN DIFFERENT LAYERS OF A SEMICONDUCTOR DEVICE |
| 摘要 |
A method and system for controlling the amount of a second material incorporated into a first material by controlling the amount of a third material which can interact with the second material. |
| 申请公布号 |
US2015171258(A1) |
申请公布日期 |
2015.06.18 |
| 申请号 |
US201514625649 |
申请日期 |
2015.02.19 |
| 申请人 |
First Solar, Inc. |
发明人 |
Allenic Arnold;Barden John;Liao Feng;Peng Xilin;Powell Rick C.;Ring Kenneth M.;Xiong Gang |
| 分类号 |
H01L31/18;C23C16/455;H01J37/34;C23C16/48;C23C16/448;C23C16/28;C23C16/52;C23C16/40 |
主分类号 |
H01L31/18 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
Perrysburg OH US |
