摘要 |
A transparent conductive oxide (TCO) layer formed using a post-TCO layer deposition process to increase roughness, aspect ratio and/or peak-to-valley heights of the surface topography relative to as-grown surface topography, and systems, apparatuses and methods thereof. A TCO layer is provided or formed with an as-grown surface topography, and processes are performed to the as-grown surface topography to modify the surface topography to increase roughness, aspect ratio, and/or peak-to-valley heights. The increase in roughness, aspect ratio, and/or peak-to-valley heights of surface topography is performed by at least one of increasing the heights of the peaks and increasing the depths of the valleys. The increase in roughness, aspect ratio, and/or peak-to-valley heights of surface topography can be to a desired or predetermined roughness and/or aspect ratio or an amount of increase in aspect ratio. |