发明名称 WAFER DESIGN UV REACTOR
摘要 An UV reactor system (1) that allows single or multiple flange- less reactors to be installed between the flanges of existing piping systems (9). Benefits include reduced installation space and lamp placement flexibility to improve UV treatment. Each reactor (1) can be rotated, pre and post installation, to provide multiple positions for the radiation sources that are included in each reactor (1).
申请公布号 WO2015087161(A1) 申请公布日期 2015.06.18
申请号 WO2014IB02988 申请日期 2014.12.13
申请人 ATG R&D LIMITED 发明人 JOSHI, RICHARD
分类号 C02F1/32 主分类号 C02F1/32
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