发明名称 LOW ETCH PROCESS FOR DIRECT METALIZATION
摘要 <p>An aqueous treatment solution for increasing the cleaning capability of a treated copper surface comprising: a) an organic compound selected from the group consisting of organic acids, alcohols, ketone, nitriles and combinations of one or more of the foregoing; and b) an oxidizing agent. The aqueous treatment solution is usable in a process for metallizing the walls of holes within a printed wiring board substrate having metallic and non-metallic regions, wherein the printed wiring board is treated with a reducing agent and then contacted with an aqueous dispersion of carbonaceous particles to form a coating of the dispersion over the substrate. The process comprises the step of contacting the metallic regions of the printed wiring board substrate with the aqueous treatment solution to remove deposited carbonaceous particles therefrom. The aqueous treatment solution provides a clean copper surface while providing a low microetch rate.</p>
申请公布号 WO2013109404(A3) 申请公布日期 2015.06.18
申请号 WO2012US72260 申请日期 2012.12.31
申请人 MACDERMID ACUMEN, INC. 发明人 FENG, KESHENG;NABLE, JUN;MCCAHERTY, ADAM
分类号 C23F1/00 主分类号 C23F1/00
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