ELECTROSTATIC CHUCK AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME

摘要

An ESC may include a dielectric layer, an electrode, a pedestal, a heater, an adhesive and a protecting ring. The dielectric layer may be configured to support a substrate. The electrode may be disposed in the dielectric layer and is configured to form plasma over the substrate. The pedestal may be disposed under the dielectric layer. The heater may be disposed between the pedestal and the dielectric layer and is configured to heat the substrate. The adhesive may be disposed between the pedestal and the heater, and between the heater and the dielectric layer. The protecting ring may be configured to surround the adhesive. The protecting ring may include a plasma-resistant material.

主权项

1. An electrostatic chuck (ESC) comprising:
a dielectric layer configured to support a substrate; an electrode disposed in the dielectric layer and configured to form plasma over the substrate; a pedestal disposed under the dielectric layer; a heater disposed between the pedestal and the dielectric layer and configured to heat the substrate; an adhesive disposed between the pedestal and the heater, and between the heater and the dielectric layer; and a protecting ring configured to surround the adhesive, wherein the protecting ring includes a plasma-resistant material.