发明名称 OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES
摘要 An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.
申请公布号 US2015168846(A1) 申请公布日期 2015.06.18
申请号 US201414560756 申请日期 2014.12.04
申请人 Carl Zeiss SMT GmbH 发明人 Schwertner Tilman;Bingel Ulrich;Limbach Guido;Kaller Julian;Scherle Hans-Juergen;Kugler Jens;Schaffer Dirk;Gellrich Bernhard
分类号 G03F7/20;G02B27/00 主分类号 G03F7/20
代理机构 代理人
主权项
地址 Oberkochen DE