| 摘要 |
PROBLEM TO BE SOLVED: To provide an illumination system in which uniformity of the object field illumination is improved.SOLUTION: An illumination system for EUV microlithography includes an EUV light source (3) generating EUV illumination light (10) having an etendue larger than 0.01 mm. More specifically, the EUV light source (3) generates an EUV optical pulse sequence having a pulse sequence frequency. An illumination optical system of the illumination system is used for guiding the illumination light (10) from the light source (3) to the object field. Preferably, at least one optical modulation component (25) can be modulated in synchronism with the pulse sequence frequency. |
