STRUCTURE AND METHOD FOR A SRAM CIRCUIT

摘要

The present disclosure provides an integrated circuit formed in a semiconductor substrate. The integrated circuit includes a first static random access memory (SRAM) cell having a first cell size; and a second SRAM cell having a second cell size greater than the first cell size. The first SRAM cell includes first n-type field effect transistors (nFETs) each having a first gate stack. The second SRAM cell includes second nFETs each having a second gate stack different from the first gate stack.

主权项

1. A method comprising:
forming a first static random access memory (SRAM) cell of a first cell size on a substrate, wherein the forming of the first SRAM cell includes forming first n-type fin field-effect transistors (nFinFETs) using a first nFinFET formation process; and forming a second SRAM cell of a second cell size on the substrate, wherein the forming of the second SRAM cell includes forming second nFinFETs using a second nFinFET formation process different from the first nFinFET formation process, wherein the second cell size is greater than the first cell size.