| 发明名称 |
Photomask and Method for Forming the Same |
| 摘要 |
A photomask having a machine-readable identifying mark and suitable for manufacturing integrated circuit devices and a method for forming the photomask and identifying mark are disclosed. An exemplary embodiment includes receiving a design layout corresponding to a pattern to be formed on a photomask blank. A specification of an identifying code is also received along with the photomask blank, which includes a substrate, a reflective layer, and an absorptive layer. A first patterning is performed using the design layout. A second patterning is performed using the specification of the identifying code. |
| 申请公布号 |
US2015168826(A1) |
申请公布日期 |
2015.06.18 |
| 申请号 |
US201514630487 |
申请日期 |
2015.02.24 |
| 申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Lee Hsin-Chang;Chen Chia-Jen;Hsu Pei-Cheng;Yen Anthony |
| 分类号 |
G03F1/76;G06F17/50 |
主分类号 |
G03F1/76 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for manufacturing a photomask, the method comprising:
receiving a design layout corresponding to a pattern to be formed on a photomask blank; receiving a specification of an identifying code; receiving the photomask blank including a substrate, a reflective layer, and an absorptive layer; performing a first patterning using the design layout; and performing a second patterning using the specification of the identifying code. |
| 地址 |
Hsin-Chu TW |
