发明名称 |
SUBSTRATE PROCESSING APPARATUS AND METHOD FOR DETECTING AN ABNORMALITY OF AN OZONE GAS CONCENTRATION |
摘要 |
A substrate processing apparatus is provided that includes an ozonizer for generating ozone gas and an ozone sensor for detecting an ozone gas concentration. The substrate processing apparatus processes a substrate by using the ozone gas supplied from the ozonizer. The substrate processing apparatus includes a monitor unit for monitoring the ozone gas concentration detected by the ozone sensor and a control unit for detecting an abnormality of the ozone gas concentration based on the monitored ozone gas concentration and the monitored discharge power. |
申请公布号 |
US2015168363(A1) |
申请公布日期 |
2015.06.18 |
申请号 |
US201414565747 |
申请日期 |
2014.12.10 |
申请人 |
Tokyo Electron Limited |
发明人 |
KONDO Masaki |
分类号 |
G01N33/00 |
主分类号 |
G01N33/00 |
代理机构 |
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代理人 |
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主权项 |
1. A substrate processing apparatus for processing a substrate by using ozone gas comprising:
an ozonizer for generating ozone gas; an ozone sensor configured to detect an ozone gas concentration of the ozone gas generated by the ozonizer; a monitor unit configured to monitor the ozone gas concentration detected by the ozone sensor and a discharge power of the ozonizer; and a control unit configured to detect an abnormality of the ozone gas concentration based on the monitored ozone gas concentration and the monitored discharge power. |
地址 |
Tokyo JP |