发明名称 |
PERHYDROPOLYSILAZANE, COMPOSITION CONTAINING SAME, AND METHOD FOR FORMING SILICA FILM USING SAME |
摘要 |
[Problem] To provide a perhydropolysilazane making it possible to form a silica film with minimal defects, and a curing composition containing the perhydropolysilazane. [Solution] The present invention provides a perhydropolysilazane having a weight-average molecular weight of 5000-17000, characterized in that when 1H-NMR of a 17% by weight solution of the perhydropolysilazane dissolved in xylol is measured, the ratio of the amount of SiH1,2 relative to the aromatic ring hydrogen content of the xylol is 0.235 or less and the ratio of the amount of NH relative to the aromatic ring hydrogen content of the xylol is 0.055 or less. The present invention also provides a method for forming a silica film, the method including applying the curing composition on a substrate and applying heat. |
申请公布号 |
WO2015087847(A1) |
申请公布日期 |
2015.06.18 |
申请号 |
WO2014JP82468 |
申请日期 |
2014.12.08 |
申请人 |
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S. A. R. I. |
发明人 |
OKAMURA TOSHIYA;KANDA TAKASHI;SAKURAI ISSEI;BARNICKEL BERND BERTRAM;AOKI HIROYUKI |
分类号 |
H01L21/316;C01B21/082 |
主分类号 |
H01L21/316 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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