| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a resist ink having excellent resist tendencies as well as printability to be used for obtaining optimum fine images desired for various electronic parts by etching, and to provide a method for forming a resist pattern using the ink. <P>SOLUTION: The resist ink contains: an alkaline soluble resin having an acid value of at least 150 (gKOH/g) and a weight average molecular weight of 500-5,000 and solid at 25°C; and an organic solvent having a vapor pressure of at most 0.02 kPa at 20°C and a swelling rate of a silicone blanket of 5-20%; wherein the viscosity at 25°C is 5-20 Pa s. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
