| 摘要 |
In the present invention, provided are a glass substrate which prevents a dissolver from melting and high distortion point from being created, a glass substrate which inhibits devitrification and high distortion point or a glass substrate which performs high distortion point and high etching rate and a manufacturing method thereof. The glass substrate for display comprises SiO_2 and Al_2O_3; 0-8 m% of B_2O_3; 0.01-0.8 m% of R_2O; 0.05-1 value of BaO/RO and the distortion point is not less than 670 degree Celsius. In the present invention, the glass substrate for display comprises SiO_2, Al_2O_3 and MgO, 0.1-0.9 value of MgO/(RO+ZnO) and a glass whose distortion point is not less than 700 degree Celsius and heat contraction rate is between 5 and 75 ppm. |
