| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a technique for efficiently growing a film on a lot of substrates of various types according to a vacuum deposition method. <P>SOLUTION: A vacuum deposition device performs deposition on first and second substrates 51 and 52 through first and second masks 31 and 32 in a vacuum chamber 2. The vacuum deposition device comprises: holding means 80 for holding the first and second substrates 51 and 52; mask support parts 17 and 18 for supporting the first and second masks 31 and 32 respectively; and first and second XYθstages 15 and 16 for respectively positioning the mask support parts 17 and 18 out of contact therewith. The first and second XYθstages 15 and 16 are each shaped in a horseshoe form. The first XYθstage 15 has end portions opposed to those of the second XYθstage 16, respectively. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
