ELECTRON GUN, ELECTRON BEAM EXPOSURE SYSTEM AND EXPOSURE METHOD

摘要

Problem It is to provide an electron gun which is capable of reducing a quantity of sublimation attributable to heat from an electron source for emitting electrons and thereby allowing stable use for a longer period of time, and to provide an electron beam exposure apparatus and an exposure method using this electron gun. The method to solve An electron gun 101 includes an electron source 20 configured to emit electrons. The electron source 20 includes an electron emission region 20a configured to emit the electrons and an electron emission restrictive region 30 configured to restrict emission of the electrons. The electron emission restrictive region 30 is located on a side surface of the electron source 20 except an electron emission surface on a tip of the electron source 20 and is covered with a different material from the electron source 20. The electron gun emits thermal field-emitted electrons by applying an electric field to the tip while maintaining a sufficiently low temperature to avoid sublimation of a material of the electron source 20. The material of the electron source 20 may be lanthanum hexaboride (LaB 6 ) or cerium hexaboride (CeB 6 ). The electron emission restrictive region 30 may be covered with carbon.