液浸上層膜形成用組成物及びレジストパターン形成方法,申请号JP20120038007-传众专利搜索

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发明名称	液浸上層膜形成用組成物及びレジストパターン形成方法
摘要
申请公布号	JP5737211(B2)	申请公布日期	2015.06.17
申请号	JP20120038007	申请日期	2012.02.23
申请人	ＪＳＲ株式会社	发明人	田中希佳;草開一憲;羽山孝弘;峯岸信也;佐藤光央;池田憲彦
分类号	G03F7/11;G03F7/38;H01L21/027	主分类号	G03F7/11
代理机构		代理人
主权项
地址

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